The photosensitivity of the titanium dioxide films on titanium substrate formed by the electrochemical, thermal, or sol-gel method was compared under the same conditions. The surface topologies of the samples were characterized by the atomic-force microscopy. It was found that the comparable increases of the sample photopotentials were observed either after the introducing of F¯-containing component into the anodizing solution or after the annealing of pure titanium at 500 °C. The cumulative effect of the anodic oxidation and further heat treatment of titanium on IPCE of Ti|TiO2 system was established.
